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MEMSnet Home: MEMS-Talk: S1813: time and temperature hardbake before SiDRIE
S1813: time and temperature hardbake before Si DRIE
2005-07-25
Michael D Martin
S1813: time and temperature hardbake before SiDRIE
2005-07-25
Shile
S1813: time and temperature hardbake before SiDRIE
Shile
2005-07-25
"If your etch profile needs to be absolutely vertical" ..." you might
not want a vertical resist profile."

Now there's some food for thought.

-----Original Message-----
From: Michael D Martin
Subject: RE: [mems-talk] S1813: time and temperature hardbake before
SiDRIE

Julie,
   If your etch profile needs to be absolutely vertical and you have
small features you might not want a vertical resist profile. The resist
at the edge of your features will charge up during the etch and may
cause footing at the top of the hole. When STS installed our system, we
spent considerable time optimizing the angle of the resist profile in
order to get high quality small features. Seems like the angle was ~45
deg.
  In general though, I agree with Robert. I think you are re-flowing the
resist, so try lowering your temperature and increasing the bake time.
reply
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