I guess it is easier to lift off metals if you have a negative sloped
sidewall in your resist. This should make your result cleaner at the
feature edges as the deposited film is discontinuous there. Another
reason is perhaps that the photomasks for lift-off are usually
bright-field, which makes alignment easier.

Jobert van Eisden
SUNY Albany

-----Original Message-----
From: Josef Kouba
Sent: Friday, August 12, 2005 10:00 AM
To: 'General MEMS discussion'
Subject: [mems-talk] Lift-off using imige reversal

What is the advantade of using imige reversal for lift-off? why is the
normal lift-off not better?