Regina

> I got a "problem"- in the process I use for masking and dryetching my
> photoresist (Az 5214) gets so "hardened that I can remove it with
> conventional means such as aceton, developer or KOH.

When it is hardbaked really "well" 5214 can be difficult to remove.  Did
you try heating the acetone (~90C) and using ultrasonic agitation? If
this doesn't work, NMP is also an option (I warm it to ~70C).  Also, if
it won't hurt the underlying structure, 1:4 H2O2 and H2SO4 will pull it
off.  5214 will go on pretty thin and that might make removal easier.

--Jonathan

BTW, I used to drive through Kaiserslautern when I was a GI.