Rather than changing your metal process, I suggest you should change
your etching process. Try using Hydrazine+was- in your electroless etch
stop technique. This particular anisotropic etch does not attack metal
layers but gives a very good and selective silicon etch. Simon Fraser
University in Canada is probably one of the few places where Hydrazine
and water, is used routinely. You can contact Dr. Ewa Czyzewska for more
details (czyzewsk+AEA-cs.sfu.ca).

Cheers,
--
Bahram Ghodsian, Ph.D.,
Senior Research Engineer,

RF Microsystems Inc.,                               bghodsian+AEA-rfmsd.com
4711 Viewridge Avenue,                                 Tel:619-278-1300
San Diego, CA 92123-1669                               Fax:619-278-3030

-----Original Message-----
From: Wouter van der Wijngaart +ADw-wouter+AEA-elixir.e.kth.se+AD4-
To: MEMS+AEA-ISI.EDU +ADw-MEMS+AEA-ISI.EDU+AD4-
Date: Sunday, May 31, 1998 12:48 AM


+AD4APA-fontfamily+AD4APA-param+AD4-Monaco+ADw-/param+AD4APA-bigger+AD4-Hi,
+AD4-I am a PhD student working on a new electroless etch stop technique.
+AD4-Could you help me with the following problem:
+AD4-What kind of metal process do I need to get a gold layer on silico
+AD4-which survives KOH or TMAH at high temperatures. We have tried
+AD4-evaporated Au/Cr but that comes of after a few hours?
+AD4-If you can help me please e-mail:
+AD4APA-color+AD4APA-param+AD4-0000,0000,C0C0+ADw-/param+AD4-c.m.a.ashruf+AEA-
et.tudelft.nl
+AD4-
+AD4APA-/color+AD4-Thanks+ADw-/bigger+AD4APA-/fontfamily+AD4-
+AD4-
+AD4-
+AD4-Try out Ti/W as a first layer. It works for Pt electrodes in KOH....
+AD4-
+AD4-Wouter van der Wijngaart
+AD4-Kungl. Tekniska H+AD0-F6gskolan Tel:  - (0)8 - 790 66 13
+AD4-S3, Elektrisk m+AD0-E4tteknik Fax:  - (0)8 - 10 08 58 +AD0-20
+AD4-100 44  Stockholm Minicall:  - (0)740 - 26 71 28+AD0-20
+AD4-Sweden e-mail: wouter+AEA-s3.kth.se
+AD4-http://www.s3.kth.se/instrlab/staff/wouterw.html