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MEMSnet Home: MEMS-Talk: PDMS photoresist recipe
PDMS photoresist recipe
2005-11-14
sokwon Paik
2005-11-14
Vijay Sivan
2005-11-15
emelianov
2005-11-14
[email protected]
2005-11-15
Vinodh Murali
2005-11-17
[email protected]
2005-11-18
[email protected]
PDMS photoresist recipe
emelianov
2005-11-15
Hello Sokwon,

please let you see the product information about Dow Corning Low-Stress
Photopatternable Silicones WL-5000 series.
For example WL-5150 (th=15-40mkm), WL-5350 (th=18-50mkm) and WL-5351
(th=6-18 mkm). From my experience, you can dilute
base solution to tune the viscosity (layer thickness).
 Regards

Vitali

-----Ursprüngliche Nachricht-----
Von: [email protected] [mailto:[email protected]] Im
Auftrag von Vijay Sivan
Gesendet: Tuesday, November 15, 2005 01:00
An: General MEMS discussion
Betreff: Re: [mems-talk] PDMS photoresist recipe

Hi,
Wondering why you have to coat on photoresist and do the UV exposure. PDMS
is thermally cured and not optically.
Cheers
VJ

----- Original Message -----
From: "sokwon Paik" 
To: 
Sent: Monday, November 14, 2005 2:42 PM
Subject: [mems-talk] PDMS photoresist recipe

> Does anybody know the recipe for the PDMS for photoresist?
>
> I want to coat around 2 micro meter and then do the UV exposure.
>
reply
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