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MEMSnet Home: MEMS-Talk: Boron implantation/thermal diffusion
Boron implantation/thermal diffusion
2005-12-19
Vinay
2005-12-19
Tao
2005-12-23
neal@zbzoom.net
2005-12-20
Roger Brennan
2005-12-21
bob hou
2005-12-23
neal@zbzoom.net
2005-12-22
neal@zbzoom.net
2005-12-22
neal@zbzoom.net
Boron implantation/thermal diffusion
neal@zbzoom.net
2005-12-22
Hello,

You can easily Obtain what you need from Filmtronics they have an excellent
line of doping materials from spin-on dopant sources , diffusion preforms
and solid planar sources.

I think you can easily accomplish what you need to do with the Poly Boron
Film they make or their B216 and do this easily obtaining 25 micron depth.


Please contact them at 724 352 3790 or sales at Filmtronics.com

They can easily help you.


Neal


>Hello All,
>We are trying to perform boron diffusion on silicon and hoping to achieve
>depths in the range of 20 to 25um. I spoke to a couple of companies who do
>ion implantation and they suggested i go with thermal diffusion of boron as
>against ion implantation. What do you guys think? Any suggestions or
>comments would be greatly appreatiated.
>
>Thanks,
>vinay

Neal Christensen
675 Saxonburg Rd.
Box 1571
Butler, PA 16003-1571 USA

T-724-352-4433
F-724-352-7680

neal@zbzoom.net


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