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2005-12-30
Ranjini Menon
2006-01-02
David Nemeth
2006-01-02
Wilson, Thomas
[email protected]
David Nemeth
2006-01-02
Ranjini,
   The solvent you use will depend on how and why you are cleaning your
wafer.  Methanol and Ethanol leave little residue when you blow them dry.
Acetone is more effective, but if allowed to dry on the wafer will leave a
very persistant residue.
   Please be aware that TCE causes cancer and should be used with a fume
hood only.  IPA, Methanol, and Ethanol are much safer, although you really
want to avoid breathing the vapors of any solvent.


David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA 20151

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of Ranjini Menon
Sent: Friday, December 30, 2005 12:37 AM
To: [email protected]
Subject: [mems-talk] [email protected]


Hello all,
I wish to buy some cleaning solvent for Ultrasonic cleaning process.
This is for semiconductor wafer cleaning .
Could u pls tell me whether i should go for IPA or TCE?
reply
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