HI Liu,

Really appreciate your work and feedback.

As I mentioned in previous mail, adding more developer will help. My
experience is that SU-8 developer saturates with PR quickly or slow down
the development rate soon. I guess that is why the SU8 manual suggests
second bath.

In fact I feel interesting why you are so serious about the amount and
time the developer added. I used a 4” crystallizing dish container for
3” Si wafer with SU8-2025 1500-3000 rpm, of about 1cm deep developer
solution. I also leave it there for 5 minutes, or even 10 minutes more.
Does it really matter to limit the developer amount and also count the
time so seriously? I am just curious : >

Anyway, as long as you reach your goal and know the limiting factor,
that would do for you and us. Thanks.

ucla
Zeta


yul.fany@gmail.com wrote:

>Happy New Year!
>
>I think it might be helpful to keep you guys posted about my testing.
>Today, I used a larger container for SU8 developer ( I used to use a
>4in glass petri-dish) and refresh developer after each use. The
>fabrication process is the same as before.
>
>For now, it seems that using more developer might help. However, I
>compared the difference between beaker and petri-dish about 2 months
>ago, and at that time, there was no difference -- see bright edges in
>both cases.
>
>Best,
>Liu Yu
>