Hi all,

 I am facing a problem in putting on 950K PMMA resist 2% on top of Gold.
Here is my procedure:

 1) Ti/Au (5nm/20nm) pattern on top of a blank quatz substrate
 2) Spin on 950K resist with 400rpm and baking for 1hr @160C
 3) Deposit 10nm Aluminum. (I wanna do ebeam lith. and because quartz is not
conductive. So, I put on Al)

 Even I haven't carry out any E-beam lith. process, I just etch away the Al
layer using developer. The resist which sit on top of Au layer has shrinkage
effect. Those part of resist which sit on top of blank quartz wafer doesn't
have this problem.
 Does anyone know what's going on in my case?

Thanks.

Hoyin