Hi Ron,

You can use AZ9260 (~2-5 um) as mask. for etching you can use a gas mixture
of CF4:O2 9 sccm:1sccm, power 350 W.

Pradeep



On 2/2/06, Ron Linklater  wrote:
>
> I am looking for some advice on reactive ion etching of silicon nitride.
>
> Particularly, which photoresists would be suitable masks for RIE of a
> silicon nitride layer over a Si wafer?
>
> I am also looking for a RIE recipe to get us started.  We have SF6 and
> CF4 gas available.
>
> We'd like to then wet etch the Si wafer using the SiN as a hard mark.
>