I would make a 1X drawing with AutoCad.  One thing to keep in mind is
that systems used to make photomasks typically understand lines, but not
arcs and circles.  If your AutoCad drawing has arcs or circles, these
will likely be converted to polygons.  This usually isn't noticeable.
However, to be safe you can represent arcs and circles in your drawing
with polygons with a sufficiently large number of sides.

Roger Shile

-----Original Message-----
From:  MAI, JUNYU
Sent: Thursday, February 09, 2006 9:19 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Making a Cr mask with rings

Hi,
I'm trying to make a Cr Mask with concentric rings, with radius from
100-1000um and 3um
width(Rout-Rin). I generated the pattern with L-eidt and pds2tap. But
the machine was hanging up
by the pattern. All it can made is a windmill like pattern with 4 groups
of concentric arcs (about
30 degrees). Our mask maker suggested me to generate the pattern using
AutoCAD. I'm thinking maybe
I should make a 10x scaling and do a 10x reduction photolithography
later. Do you have any
suggestions? Thanks alot!