Dear Colleagues,
I'm hoping that someone out there can share some advice with me. We've fully
commercialized a patented pre-filter designed to protect RO systems. The
cartridge is highly efficient for removing suspended sub-micron particles, has a
very high dirt holding capacity and will run 3-10 times longer than conventional
filters. The technology is based on natural electrostatic attraction. Particles
are attracted and permanently retained onto the filter much like a magnet would
collect iron dust.  The flowrate is equal to a 3 micron filter, yet it is very
efficient at removing particles smaller than 0.2 microns.   It will remove
bacteria as well as all other types of particles. I have been told that ultra
pure water is important for microelectronic processes. Can anyone be so kind to
tell me how a cartridge of this type may be used in MEMS development?

Cindi Tepper
Argonide Corporation
Sanford, FL USA
407-322-2500