Dear All,

I am facing problem in getting smmoth bottom surface in DRIE process by
ALCATEL machine.
Process parameters are - SF6- 300, C4F8- 150, etch/pass - 7/2, Coil power -
1800 W, platen - 80 W, temperature - 10C.

Surface obtained after etching (even after 5 min etch) is rough.

Can any one advice me anything to make the surface smooth or to improve the
surface quality after etching process. Can any one suggest some suitable
recipe for getting smooth surface? I will not mind if this new recipe affect
the etch rate. My priority is to get as smooth surface as possible. Will
reducing the C4F8 will help ?

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Thanks,
Pradeep Dixit