Hi Duan,

In Silicon wet etching by TMAH,high etch rates result
in rougher final surfaces. And high etch rates are
achieved by diluting the TMAH solution. Depending on
the temperature, the maximum etch rate occurs with
TMAH solutions of 5-10%.
For details, you can refer to papers on TMAH etching.
About the conditions, for this method, you will need a
heated TMAH bath.

Alireza Hajhosseini Mesgar
MASC Student and Research Assistant
Concordia University
Montreal, Quebec, Canada

--- Duan  wrote:

> Hi all,
>
> Does someone know how to get rough silicon surface?
> in micron size.
>
> I searched the reference, and know the black silicon
> method might work. And
> someone said that they observed black silicon
> surface after wet etching.  I
> want to know some details about it, like the sample
> preparation, the
> experimental condition and the exact roughness of
> the sample surface.
>
> any reply and any information is appreciated.