A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Adhesion problem with LOR 3A resist
Adhesion problem with LOR 3A resist
2006-03-29
Ferda Mravenec
2006-03-30
Bill Moffat
2006-03-30
Shile
2006-03-30
Bill Moffat
Adhesion problem with LOR 3A resist
Shile
2006-03-30
There is no need for vapor prime with LOR.  The LOR/resist bilayer
approach, in my experience, is much simpler ard more reliable than image
reversal.

Roger Shile

-----Original Message-----
Ferda,
      Vacuum vapor prime will vacuum dehydrate totally then apply HMDS
while the substrate is dehydrated.  The HMDS can only react with
Hydroxyl ions which are bound tightly to the substrate.  There is no
possibility of poor adhesion. Contact me for details of free test and
test of image reversal for totally controlled lift off.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
University Wafer
MEMStaff Inc.
The Branford Group