Roger,
      Vacuum vapor prime allows total control of the surface tension of
the substrate. It may be that with the different surfaces discussed he
needs to use a method to match all the different surface tension
conditions.  He has a problem with some surfaces or I would not have
suggested Vapor prime. Image reversal allows standard positive resist,
no complications and the ability to produce 0.08 micron dimensions,
without the expense of additional resists.  This is in my experience and
the experience of literally hundreds of photo resist engineers.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353