A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Cu will be oxidized Re: Growing SiN on copper film using PECVD?
Growing SiN on copper film using PECVD?
2006-04-04
Xiaoding wei
2006-04-19
K A Chan
Cu will be oxidized Re: Growing SiN on copper film using PECVD?
2006-04-23
yuzhul@eden.rutgers.edu
Cu will be oxidized Re: Growing SiN on copper filmusing PECVD?
2006-04-24
Glenn Silveira
2006-04-25
K A Chan
Cu will be oxidized Re: Growing SiN on copper film using PECVD?
2006-04-26
yuzhul@eden.rutgers.edu
Cu will be oxidized Re: Growing SiN on copper film using PECVD?
yuzhul@eden.rutgers.edu
2006-04-23
No, you can't. Cu will quickly by oxidized in PECVD chamber.
And you will find Cu/SiN cracked and peels off.

> Yes. You can. SiN layer can be used as Cu diffusion layer.
>
> ----- Original Message -----
> *From:* "Xiaoding wei" 
> *To:* mems-talk@memsnet.org
> *Sent:* 04 April 2006 03:46:34
> *Subject:* [mems-talk] Growing SiN on copper film using PECVD?
>
>
>> Hi, Does anyone know if I can grow a SiN layer on copper film using
>> PECVD method?
>
>

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
Addison Engineering
MEMStaff Inc.
The Branford Group