Dear all,
   Now, I try to use SF6 dry etching SiN by RIE due to so higher
selectivity that photoresist can be as mask directly, but the problem is
that the etching is almost isotropic. But I need the vertical SiN pattern.
So do you have some good suggestions or ideas on how to get the vertical
profile by SF6 RIE etching SiN?

Thank you very much ahead!

Have a nice bank holiday!

ruying

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Ruiying Zhang, Electrical & Electronic Engineering,
University of Bristol
Tel:0044-0117-928-8136(O)
ry.Zhang@bristol.ac.uk