Hello,

  I used PECVD Silicon Nitride as a mask to etch silicon
  using KOH solution. But the silicon nitride film peeled off
  when I put the wafer in KOH solution (44% weight at 85 C).

  If I anneal the silicon nitride film will it work? Can anyone give
  me a good recipe for PECVD Silicon Nitride which will work as
  mask for KOH etching?

  Thank you,

  Zia