Alex,

Another thing to remember is that your dose will change when exposing a
glass substrate vs. A silicon substrate with SiO2 on it - the silicon
surface is still reflective, while the glass surface is minimally so.
You will probably need to increase the dose to make up for this lack of
reflection.

Best Regards,
Chad Brubaker


-----Original Message-----
From: Ferda Mravenec
Sent: Tuesday, May 02, 2006 7:42 AM
To: General MEMS discussion
Subject: Re:[mems-talk] photolithography on glass problem

Dear Alex,
I do the same photolitography on glass (Bk7,soda-lime Gil49 adn newly
designed Er.dop.). I had similar problem with pattern of stripes one
month ago.
I use LOR3A and S1805. The samples must be very dry and in some case you
 need to use HMDS (hexamethyldisilazane) as promotor adhesion.
The solution of the second problem is very easy, you need
 cca. 1.2-1.3 times thicker layer of the LOR resist, becouse
 you need make undercut. In your case you should use LOR5A
or LOR7B and S1805. For Lift-Off you don't use CD-26, it's
developer, you must use some REMOVER, like R1165 (works very well).
If you put the substrate in R1165 for 10 min, the metal comes out.