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MEMSnet Home: MEMS-Talk: Re: Uniformity of AZ P4620 Photoresist
Re: Uniformity of AZ P4620 Photoresist
1998-03-22
Chia-Lun Tsai
Re: Uniformity of AZ P4620 Photoresist
Chia-Lun Tsai
1998-03-22
>I am attempting to spin AZP4620 at ~10um.  I have used many variations
>on the manufacturer's specified recipe for a 10um coat.  After the
>prebake the uniformity is not that good.  I would like uniformity as I
>would expect in OCG 825 or Shipley 1818.  Q1: what Should I expect for
>uniformity.  Q2: are there any key points in the application of the PR
>that you can share.  THANKS
>

The trick is the baking.   You may need long bake time and possibly lower
bake temp.

chia-lun

___________________________________________________________________
Chia-Lun Tsai, PhD
School of Electrical Engineering
402 Phillips Hall           Phone: (607) 255-0102
Cornell University
Ithaca, NY 14853-5401       ct61@cornell.edu


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