Hi All,
I am looking for an echant(wet) that etches silicon without
differentiating between doped(p) and undoped areas. I tried various
concentrations of KOH(20% to 50%) and it seemed like higher
concentrations is the way to go. But on closer observation, realized
that even at higher concentrations, the etch rate of undoped Si is
very high compared to the doped areas. Any suggestions is greatly
appreatiated,

Thanks,
Vinay