Rupesh,

You really should keep that wait time in - it is intended to allow the
resist film to rehydrate after the soft bake.  Water is a necessary
component in the photo-reaction of the resist, so the wait time is
really unrelated to the substrate.

Best Regards,
Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel:  480.727.9635, Fax:  480.727.9700  e-mail:
c.brubaker@EVGroup.com, www.EVGroup.com

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Rupesh Sawant
Sent: Saturday, June 17, 2006 3:32 PM
To: General MEMS discussion
Subject: [mems-talk] wait time for AZ P4620 for a glass substrate

I am using AZ P4620 photoresist to make a masking layer on a soda lime
glass. Is it necessary to have a wait time between the soft bake and
exposure process and also after exposure? the specification sheet tell
to keep a wait time between the processes which i have mentioned. But
that specification sheet is for silicon as a substrate. Do i need to
keep wait time if i am using glass as a substrate and if yes then why?