Pradeep,
             Anything containing silicon will be attacked by the
Fluorine in HF.  Bill Moffat

________________________________

From: [email protected] on behalf of pradeep # sharma
Sent: Sat 8/19/2006 5:13 AM
To: [email protected]
Subject: [mems-talk] Mask Material Against HF & H2O2 Wet Etch



Dear all,
I am looking for a material to be deposited on silicon wafer. Then I =
will pattern the deposited material to expose silicon wafer.
For my special processing I need a masking  material that can withstand =
the etching of a solution containing HF (50%) and Hydrogen Peroxide =
(30%) for 2 hours.

Any idea if Silicon Nitride (Si3N4) thin film on silicon can withstand =
etching of HF & H2O2 combination.