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MEMSnet Home: MEMS-Talk: Photoresist Hard Bake question
Photoresist Hard Bake question
2006-08-31
Xiaoguang "Leo" Liu
2006-09-01
Robert Black
2006-09-11
Borski, Justin
2006-09-01
Bill Moffat
Photoresist Hard Bake question
Xiaoguang "Leo" Liu
2006-08-31
Dear all
I'm using AZ926 photoressit for a thickness of 20um. However, after
hardbake (85 degree C for 20minutes), the photoresist reflows and does
not maintain the near vertical profile. I wonder if anybody knows
anyway to prevent the reflow of photoresist during the hardbake
process? Thanks a lot.

Leo

Electrical and Computer Engineering
Purdue University
[email protected]
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