Dear all,

As I'm trying to establish several doping processes for p++ doping of
silicon wafers with boron I'm looking for some papers, suggestions and
experience reports.

The doping process will be carried out in a furnace with BN-Wafers as Boron
source.

The final aim is to create p++ doped membranes with an average thickness of
3-4microns.


Thank you for your help

Best regards,

Sebastian