A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Minimum feature size using wet etching - 3micro-m?
Minimum feature size using wet etching - 3micro-m?
2006-09-19
Bill Moffat
Minimum feature size using wet etching - 3micro-m?
Bill Moffat
2006-09-19
Hi Martyn,
          Two possible answers may be 1) Image reversal which allows the
resist image to have controllable side walls.  This allows vertical side
walls not sloping which buys you about 20% increase in resolution.
                                   Or 2) Metal lift off which allows
metal lines down to 0.1 microns.  Contact me for technical papers on
either process.
Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMStaff Inc.
The Branford Group
Mentor Graphics Corporation
MEMS Technology Review