It seems that you should retry putting on AZ first and then SU8, except that you
need to bake the heck out of your AZ, 150 to 200 C for 5 hrs b4 putting on SU8.
If this doesn't work, try SPR 220 of Shipley.

   Cheers,

  H.





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Today's Topics:

1. Re: amorphous Si ethcing (Ankush Singal)
2. RE: Bubble formation in mircochannels. (Beggans Michael H IHMD)
3. photoresist peeled off together with PDMS (Bo Bob Huo)
4. How to recalibrate a zero volt ionizer (jiaxing Yang)
5. RE: photoresist peeled off together with PDMS (Mike Pinelis)
6. PDMS bubble formation... (g.balsubra manian)
7. Re: photoresist peeled off together with PDMS (Huaibin Zhang)
8. two layer fabrication by AZ P4620 and SU8 2050? (qingye lu)
9. To remove Al layer from PMMA/glass substrate (Hyunsoo Park)
10. RE: To remove Al layer from PMMA/glass substrate (Mathieu Foquet)
11. Re: amorphous Si ethcing (Young Rae Hong)
12. Re: PDMS bubble formation... (Huaibin Zhang)


----------------------------------------------------------------------

Message: 1
Date: Fri, 13 Oct 2006 12:23:22 -0400
From: "Ankush Singal"
Subject: Re: [mems-talk] amorphous Si ethcing
To: "General MEMS discussion"
Message-ID:
<[email protected]>
Content-Type: text/plain; charset=ISO-8859-1; format=flowed

what is mesa etching

On 10/13/06, Isaac Chan wrote:
>
> Young,
>
> CF4 do create some polymerization and the polymer will accumulate on
> chamber wall over time after several runs. Do you clean your chamber with
> O2 plasma? a-Si:H at that thickness is yellowish brown color. Sometimes it
> can be confused with the polymer layer deposited on the etched area. When
> you say it doesn't etch, do you mean it looks the same by eye, by SEM, or
> has the same thickness measured by a profiler?
>