The best I can think of would be to perform the bake in a vacuum
hotplate - this will increase the general vapor pressure of the solvent
for a given temperature.

However, I don't know if even this will be sufficient for the E-beam
resists.

Best Regards,
Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel:  480.727.9635, Fax:  480.727.9700  e-mail:
c.brubaker@EVGroup.com, www.EVGroup.com

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of jpt sharma
Sent: Thursday, December 07, 2006 9:37 AM
To: General MEMS discussion
Subject: [mems-talk] E-beam lithography

HI all
  Is there anyway to do ebeam lithography with out baking the e-beam
resist after spinning? OR baking at low temperaute <80 C