No experience with it, but have you considered plasma ashing with O2?


-----Original Message-----
From: Steckenborn Arno 
To: [email protected] 
Date: Thursday, May 28, 1998 12:39 PM
Subject: Remover for SU8-Resist


>Hello everybody,
>
>we tried the photoresist EPON SU-8 epoxy resin; according to
>informations in 'Micromachine Devices' and data sheets coming with the
>resist, suitable developer is XPSU8 (PGMEA). The solvent for the resin
>is GBL - gamma-butyloracton.
>>From the supplier we got no hints to the SU8-remover, but the (funny)
>advices only to lift the resist using a sacrifical thin resist layer
>underneath the SU8 - or simply to leave it on the wafer  :-(
>Fatal is the fact, that the resist, if once polymerized, cannot be
>dissolved and removed by any means (solvent, EKC270, Aceton etc.).
>
>Has anyone experience in processing SU8 and to dissolve this resist if
>polymerized??
>
>Any response is appreciated
>Tanks in advance
>Arno Steckenborn
>
>
>mail: [email protected]
>tel: +49-30-38624671
>fax: +49-30-38624404
>