thanks.
I have another question, Even i buy a target, i may not work.
In the sputtering system, the sample is still. It may cause problem
for sidewall. I do need the sidewall be coated with metal. So right
now, i use thermal evaporator since the sample is rotated during
deposition.
Do you have any idea to solve this problem?
Thank you. David.

On 2/6/07, David Nemeth  wrote:
> It's very challenging to evaporate an alloy for the reason you describe.
> Sputtering is usually what you need to do.  A new sputtering target may not
> give you the proper alloy composition, but after running it for a bit it
> eventually will.