This number apparently refers to only the cost of running the furnace alone
I think the author has ignored the pumps, gas handling, etc.  The cost of
running a LPCVD SiN process will be considerably more than the cost of
running an oxidation furnace.

Roger Shile

-----Original Message-----

Dear Members,

I am trying to find a cost of ownership "COO" model for LPCVD SiN Mask with
SiO2 under-layer deposition.  The mask will be used for KOH etching. On the
web I found the following:

........
Step            Description             Machine used                Cost per
wafer

....
2               Oxidation               Furnace                       $0.43
3               Nitridation             Furnace                       $0.43
.....