Dear All,

I am doing some contact angle measurement.

I have found that the contact angle of water with thermal oxided SiO2 (~1.8
um thick) is higher (~56 degree) than the contact angle with native silicon
oxide ( few nanaometer) sample (~30 degree).

I will be very thankful if someone please explain the reason behind
this difference.

Is contact angle higher because of higher thickness of thermally grown
silicon oxide (~1.8 um) ? or is it because of crystalline nature of
thermally grown oxide?

Please let me know.

Thanks,
Pradeep