Using a etching mixture of HF (50%) : H2O2 (30%) : H2O = 1:1:20 allows an etch
rate of 8000 Å/min at 20°C


> Hi,
> I need to etch Titanium in my device using a safe wet etch chemistry.  I
understand that HF is normally used to etch titanium films but this chemical is
too dangerous.  Can anyone suggest a safer wet etch chemistry?  Can I use
NH4OH:H2O2 chemistry to etch titanium?