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MEMSnet Home: MEMS-Talk: hi for help about the develop
hi for help about the develop
2007-03-13
[email protected]
2007-03-13
Shay Kaplan
2007-03-14
[email protected]
2007-03-14
Shay Kaplan
2007-03-14
Robert Black
2007-03-15
Joseph Grogan
2007-03-13
Joseph Grogan
2007-03-14
Avi Laker
hi for help about the develop
Avi Laker
2007-03-14
Avi Laker
If the resist is still present without an image - my guess would be that
120C for 10 minutes is to long, exposure is to short or developer may be
bad....

A L

Message: 4
Date: Mon, 12 Mar 2007 21:12:21 -0700
From: [email protected]
Subject: [mems-talk] hi for help about the develop
To: [email protected]
Message-ID: <[email protected]>
Content-Type: text/plain; charset=3D"ISO-8859-1"

 I spin S1813 at 4000rpm 45s.
Then hot bake 120Degree 10min
Exposure 10s, then develop 30s.After 30s, I can't see anything.
Why???
All paper recommend the develop time 30s.
reply
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