Hi,
I have thermally evaporated Chromium on patterns of crosslinked and
uncrosslinked SU-8.  Subsequently I would like to pattern a Gold film on the
Chromium by lift-off process.  The resist will be lifted off using Acetone.  Now
in my experience, when Acetone is sprayed on the resist coated wafer, not only
the resist is removed, but the underlying Chromium and the uncrosslinked SU-8
beneath the Chromium as well.

Can anyone suggest to me how I can do this process and yet prevent the Acetone
from lifting the Chromium film and the underling uncrosslinked SU-8 as well?
Thanks!

Jeffrey