Dear friends
i am working on Si etching using TMAH.
In my experiment, i am using 50 ml of 10wt% TMAH . In order to protect AL
metal, i am adding  Si powder  3.2 wt %  Si powder (1.6 gm)  and 1.3 wt %
ammonium persulphate (0.65 gm).
but at the time of etching at 90C, after 20-25 min ,  the TMAH is getting
vapourised and Added powder of Si and ammonium persulphate is remaining in
container
This is clearly sign of added material is not getting dissolved properly.
What i should do in order ti solve this problem?
please help me.
abhay joshi
university of pune