Dear all,

I am using LOR 10B lift-off resist with Shipley S1813 positive photoresist. The
developer is MF319. It performs well.

In future, I will use it with Futurrex NR7-1500P negative photo resist. The
developer will be Futurrex RD6. I just want to know how it performs with this
developer. What is the undercut rate of LOR 10B under this condition? How to
determine the development time for both Lift-off resist and photo resist.

Can you give me any suggestion for this?

thanks a lot!

Regards,
Xiaoyuan