Hi Gareth,
Thanks for the suggestion.  I'll try 220'C for 30 mins.  As for cleaning =
the wafer, I normally use either acetone with IPA or SC-1 =
(NH4OH:H2O2:H2O =3D 1:1:5 at 70'C).
How about using SU-8 2002 as a wetting layer prior to coating with SU-8 =
2050?  If I use this prewetting appraoch, shall I fully expose and =
crosslink the SU-8 2002 before spin coating the SU-8 2050?
=20
Jeffrey

________________________________

From: [email protected] on behalf of Gareth Jenkins
Sent: Wed 3/21/2007 12:41 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Dimples in SU-8 film

120C for 2mins may not be enough to fully dehydrate your wafer. I would
recommend 220C for at least 30mins.
Also, how are you cleaning the wafer prior to dehydration? I have
experienced dimples due to a contaminated H2SO4 cleaning solution.