Hi Andrea,

for me TMAH (25%) with approx. 10% Isopropanole worked well, although
the results were not perfect. Everything depends on the etch duration
and rate.
There are people working with a reflow condensor and under megasonic
exposure reporting excellent surfaces!!

Best regards,
Jan.

PS.: If you find a good soulution please give me a short notice!!

> Von:
> "Andrea Mazzolari" 
> Datum:
> Wed, 28 Mar 2007 00:37:22 +0200 (CEST)
> An:
> "General MEMS discussion" 
>
> An:
> "General MEMS discussion" 
>
>
> Hi all, i need to realize etching of (110) silicon wafers.
> Etch is limited by (111) walls, i need to obtain very low surface
> roughness on both (111) and (110) surfaces. Is there any surfactants which
> could help ?