May be 1000 ml H2O, 100g NH4F and 2ml H2O2 mixture.  I think SiO2 is not
etched by NH4F alone. Nitric, HF acetic system would not work because HF
attacks the glass.


~~~~~~~~~~~~~~~~~~~
Dr. Alex Freeman
Engineering Manager, Etch Group
Ball Semiconductor, Inc.
Ph:972-359-2442
Fax:972-359-2413
[email protected]
~~~~~~~~~~~~~~~~~~~


> ----------
> From:         Chelly Narayana[SMTP:[email protected]]
> Sent:         Monday, July 20, 1998 1:51 PM
> To:   [email protected]
> Subject:      isotropic silicon etchant
>
> I am looking for a wet chemical etching solution that etches silicon
> isotropically and does not attack glass. If anyone out there know of
> any
> means of doing this, please send me a mail to [email protected]
>
> Thanks,
> Chellappan
>
>
>