Thanks for the call, Paul.

        Just to be clear, this question is specifically for a solvent-based
negative resist (that also uses solvent based developer).  The manufacturer
is TOK, and the resist model is OMR-83.

        I have been told that there was a study called the Kodak Interface
Conference that dealt almost exclusively on this subject.  I want to find
out how to obtain literature regarding that study.


-----Original Message-----
From: Ron Martin [mailto:[email protected]]
Sent: Tuesday, August 28, 2007 12:31 PM
To: 'General MEMS discussion'
Subject: [mems-talk] Negative resist studies

Hello,

        I am looking into obtaining literature on negative resist.  I was
told that in the 70s, there was an active body of research pertaining to
negative resist studies.  I am primarily interested in negative
cross-linking events (especially the accidental, non-intentional ones that
lead to residue).  I appreciate any help.  Thanks.