Ramakrishnna,

Have you calibrated your tooling factor?

Brent

Ramakrishna Kotha wrote:
> Hi All,
>
> I deposited Aluminum and gold metals using CHA evaporator with thickness
> Ti/Al ( 300A/3000A) and Ti/Au(300A/3000A)
> Power applied for Al: 36% and Au: 37%. But, I obtained the film
> thickness of ~4700A when I measured using the profiler.
> I replaced with the new crystal before film depositions.
>
> Can anyone suggest, what other parameters I have to take care for
> accurate film thickness deposition in the evaporator.