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MEMSnet Home: MEMS-Talk: Cr etch rate in HF
Cr etch rate in HF
2007-09-13
Sreemanth M Uppuluri
2007-09-13
Yue Mun Pun, Jeffrey
Cr etch rate in HF
Yue Mun Pun, Jeffrey
2007-09-13
Sreemanth,
How thick is your Cr layer?  I observed that evaporated Cr film is very =
porous and has a lot of pinholes.  It is possible that if Cr is =
deposited on an oxide layer.  The HF could diffuse through the pinholes =
and dissolve the underlying oxide thus lifting off the Cr layer as well.
=20
Jeffrey

________________________________

From: [email protected] on behalf of Sreemanth M Uppuluri
Sent: Thu 9/13/2007 8:27 AM
To: [email protected]
Subject: [mems-talk] Cr etch rate in HF



Hello All,

I found in literature that Cr is resistant to HF etching. But I find =
during
my experiments that Cr film is very easily getting removed when placed =
in
50% HF solution. It looks like Cr film does get etched even for very =
short
durations (~ 5 min). Does anyone know why this is happening?
reply
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