Hi,all
I am facing problem to pattern OTS hydrophobic region in a
microchannel. The method I plan to use is PR (AZ 5214 or AZ 7220)
pattern a open window on part of microchannel (100um width of channel,
OTS pattern 100x100um or 100x200um). and the OTS solution will be OTS
2mM in Hexadecane:Chloroform (4:1 by Vol). However, the problem is
that I was told that chloroform might strip the photoresist during dip
in OTS coating. Does anybody have this experience or the alternative
OTS solution recipe to avoid photoresist stripping?

Thank you very much for your sharing!

Best regards,
Yuming