Hello Edward,

Does your spin coater have backside rinsing capability?  Also, the
exhaust during spin can actually create more problems as this
dramatically increases turbulence in the spinner environment.  One more
thing to increase uniformity of the coating is a solvent rich
environment which can be achieved by a cup rinse during spin or if you
can not do this pour solvent bath in the spinner bowl.  This can be the
primary solvent of your resist.

Best Regards,

Seth Burtner
Technical Support

Filmtronics Inc.



-----Original Message-----

Edward Sebesta wrote:
> I have an MTS 8800 with splashback problems, that is photo resist
> redopositing on to the back side of the wafers.
>
> I have check the exhaust and made sure it was the maximum. I have
tried
> recipe modifications with lower acceleration for the resist spin step.
> These are the standard causes for the problem.
>
> I would like to know the following.
>
> 1. Does anyone have a contact for persons manufacturing retrofit
resist
> spin bowls?
>
> 2. Does anyone have a fix for this or suggestions.