Leo,

You can try to deposit PMMA via DC-sputtering (0.2Torr, Ar as sputtergas @
~35W)

Cheers

Sebastian

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Xiaoguang Liu
Sent: Tuesday, October 02, 2007 12:06 AM
To: Nitin Shukla; General MEMS discussion
Subject: Re: [mems-talk] Photoresist as etch mask!

May I ask why do you have to use PR as a mask?

On 10/1/07, Nitin Shukla  wrote:
> Hi,
>   I would appreciate if anyone could suggest me a photoresist that would
not be etched by TMAH or KOH.
>