=20
ciao andrea.

we use a fuji film negative resist sc 450 (original - hunt, waycoat
olin)=20
and it can hold out for about 8 minutes in a 2:1:1 ratio at a very low
temperature.=20

avi


Date: Sun, 28 Oct 2007 15:14:17 +0100 (CET)
From: "Andrea Mazzolari" 
Subject: [mems-talk] HNA resistant photoresist

Hi all,
i'm looking for a photoresist which will be resistant to HNA etch. My
HNA composition is HF: 2 parts, HNO3: 15 parts, CH3COOH: 5 parts. Etch
time is 200 minutes. So this photoresist must be resistant for a long
time. Can someone suggest a photoresist ? I have already tried S1813,
but after about 3 minutes etch it peeled off.