Dear MEMS community:

        Does anyone know how fast a high power ICP plasma system can
     anisotropically etch tungsten (etch rate in microns per minute)?  What
     was the gas mixture used?  What was the mask material(s) used.

     Richard Koba
     Foster-Miller, Inc.
     195 Bear Hill Road
     Waltham,  MA  02451-1003
     781-684-4197
     fax:  781-290-0693