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MEMSnet Home: MEMS-Talk: PR residue after CF4 RIE
PR residue after CF4 RIE
2008-07-01
Serena Eley
2008-07-01
Ad Hall
2008-07-01
Andrew Sarangan
2008-07-01
basar bolukbas
PR residue after CF4 RIE
basar bolukbas
2008-07-01
Piranha Solution (H2SO4:H2O2/3:1) eats any organic based patterns on your
sample. (resist residue, dielectric layer, polyimide etc...)

You can use this solution for residues but in order to protect other patterns
from possible attacks, you should try on dummies first.
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